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3 These methods are destructive
This Guide describes silicon wafers with nominal diameter of 300 mm although
While the static leach-out testing is recommended to verify the quality of the resin normally used in the facility
their purity has been shown to affect the device yield during the manufacturing processes
This Document is a guide rather than a standard
C00604 - SEMI C6.4 - Particle Specification for Grade 20/0.02 Nitrogen (N2) and Argon (Ar) Delivered as Pipeline Gas StdPbc-0912 3 These methods are destructiveThis Standard was technically approved by the Gases Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on September 12, 2011. Available at www. semiviews. org and www. semi. org in November 2011; originally published in 1990; previously published November 2002. NOTICE: This Document is no longer supported by the global technical committee. It has been replaced by SEMI C97. The purposes
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